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All participants (112)Only participants fully registered (payment processed) will appear listed below 
Last Name First Name Institution Country
Adler Eli Georgetown University USA
Bie Yaqing MIT USA
Bonaccorso Francesco IIT-Graphene Labs / BeDimensional Italy
Bouerdick-Berdondini Anja Clarissa Fondazione Istituto Italiano di Tecnologia Italy
Brennan Barry NPL UK
Cantatore Valentina Chalmers University of Technology Sweden
Cao Tengfei CUNY USA
Cao Xianyi Technical University of Denmark Denmark
Cellini Filippo CUNY USA
Charlier Jean-Christophe UCLouvain Belgium
Corrado Christine Proactiveinvestors North America USA
Correia Antonio Phantoms Foundation Spain
Crasta Paola Fondazione Istituto Italiano di Tecnologia Italy
Cummings Aron Catalan Institute of Nanoscience and Nanotechnology (ICN2) Spain
Cupo Andrew Rensselaer Polytechnic Institute USA
Daniels Colin Rensselaer Polytechnic Institute USA
de Lazaro Irene University of Manchester UK
Dean Cory Columbia University USA
Deckoff-Jones Skylar MIT USA
DiMarco Christopher Columbia University USA
Douglas William H. 2DLayer USA
Eginligil Mustafa Nanjing Tech University China
Eisele Max neaspec GmbH Germany
Fang Yanbo University of Cincinnati USA
Fedolak Tom Graphenea Inc. USA
Gibbs Ray Haydale UK
Green Micah Texas A&M University USA
Hader Grzegorz Stevens Institute of Technology USA
Han Peize Georgetown University USA
Hapanowicz Rick Quantum Design USA
Hara Yusuke Aoyama Gakuin University Japan
Hart Michael NanoGraphene Inc USA
Heinz Tony F. Stanford University USA
Hernandez Yenny Universidad de los Andes Colombia
Hersam Mark C. Northwestern University USA
Hill Heather National Institute of Standards and Technology USA
Hjelt Kari Chalmers Industrial Technic Sweden
Holzner Felix SwissLitho AG Switzerland
Hone James Columbia University USA
Hsieh Yu-Yun University of Cincinnati USA
Huang Kuan-Tsae AzTrong USA
Huber Andreas neaspec GmbH Germany
Hummel Stefan GETec Microscopy GmbH Austria
Iliut Maria University of Manchester UK
Jarrahi cinker Zina Nga USA
Kanakaraj Sathya Narayan University of Cincinnati USA
Kang Kyungnam Stevens Institute of Technology USA
Kim Chanul Standard Graphene USA
Kim Philip Harvard University USA
Kostarelos Kostas The University of Manchester UK
Krayev Andrey Horiba Scientific USA
Kulmala Tero SwissLitho AG Switzerland
Lakios Manny CVD Equipment Corporation USA
Lee Cathie Monash University Malaysia Malaysia
Lee Gwanhyoung Yonsei University South Korea
Li Guoqing North Carolina State University USA
Li Liwei ENN USA
Li Richard Columbia University USA
Liang Liangbo Oak Ridge National Laboratory USA
Lucking Michael Rensselaer Polytechnic Institute USA
Meyers Chris NKT Photonics USA
Mikmekova Eliska Institute of Scientific Instruments of the CAS, v.v.i. Czech Republic
Mishra Neeraj Instituto Italiano di tecnologia @NEST Italy
Mondal Jay NanoGraphene Inc USA
Munoz Enrique Pontificia Universidad Catolica de Chile Chile
Nathawat Jubin University at Buffalo , The State University of New York USA
Nguyen James Grafoid Inc. Canada
Oweimrin Michael HORIBA Scientific USA
Pan Genhua University of Plymouth UK
Pellegrini Vittorio Graphene Labs – IIT Italy
Pollard Andrew National Physical Laboratory (NPL) UK
Polyakova Elena Graphene Laboratories Inc. USA
Rastogi Shruti Columbia University USA
Ren Huaying Peking University China
Riedo Elisa ASRC-CUNY USA
Rigosi Albert National Institute of Standards and Technology USA
Robinson Joshua A. Pennsylvania State University USA
Saltzman James CVDequipment USA
Samori Paolo Université de Strasbourg France
Schiop Gabriela Proactiveinvestors North America USA
Schutz Spencer Stevens Institute of Technology USA
Senet Patrick Université de Bourgogne Franche-Comté France
Shanmugasundaram Maruda HORIBA Scientific USA
Sheremetyeva Natalya Rensselaer Polytechnic Institute USA
Shlimak Issai Bar Ilan University Israel
Stoñyarov Daniel Graphene Laboratories USA
Suess Felix Heidelberg Instruments, Inc. USA
Taniguchi Takashi National Institute for Materials Science Japan
Teo Ken AIXTRON Ltd UK
Trbovic Jelena Zurich Instruments AG Switzerland
Tristant Damien Rensselaer Polytechnic Institute USA
Tromp Rudolf IBM Thomas J. Watson Research Center USA
Tutuc Emanuel The University of Texas USA
Varonides Argyrios University of Scranton USA
Vijayaraghavan Aravind University of Manchester UK
Wang Liping University of Science and Technology Beijing China
Wang Yaguo University of Texas at Austin USA
Waqar Kasim Half Hollow Hills High School East USA
Ward Zachary Rensselaer Polytechnic Institute USA
Watanabe Takeshi Aoyama Gakuin University Japan
Wax Anja attocube systems Inc USA
Wijnaendts van Resandt Niels Heidelberg Instruments, Inc. USA
Wright Samuel CVD Equipment Corporation USA
Yan Jun University of Massachusetts Amherst USA
Yanai Kohei Aoyama Gakuin University Japan
Yang Eui-Hyeok Stevens Institute of Technology USA
Yoshimura Anthony Rensselaer Polytechnic Institute USA
Yu Gui Institute of Chemistry, Chinese Academy of Sciences China
Zhao Yaping Shanghai Jiao Tong University China
Zhou Andy Grafoid Inc. Canada
Zou Shan National Research Council Canada Canada
Zwolak Michael National Institute of Standards and Technology USA
 
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